Lead phthalocyanine films deposited by ECR plasma-induced sublimation.

Lead phthalocyanine (PbPc) thin films deposited by vacuum sublimation with Ar low-temperature electron cyclotron resonance (ECR) plasma treatment are investigated by means of reflection high-energy electron diffraction, atomic force microscopy, infrared spectroscopy, x-ray photoelectron spectroscopy and spectral ellipsometry. The intensity of plasma treatment is varied by the radio-frequency power input and the value of electrical bias applied to the sample. The films grown with and without plasma assistance are compared. The plasma intensity is considered to significantly influence the crystalline structure, surface morphology and film composition. At a low intensity the plasma assistance is analogous to vacuum annealing of films. At a medium intensity, a porous polymer matrix filled with PbPc in crystalline phases (monoclinic and triclinic) is formed in the films. At a high intensity, all the films consist of a compact polymer matrix, similar to a glassy solid, with small inclusions of PbPc molecules. The succession of PbPc molecule destructions in the growing film layer with plasma intensity increase is established by IR spectroscopy. The mechanism of polymer matrix formation is suggested. [ABSTRACT FROM AUTHOR]