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Relationship between carrier diffusion lengths and defect density in hydrogenated amorphous silicon.
- Source :
-
Journal of Applied Physics . 2/1/1997, Vol. 81 Issue 3, p1323. 8p. 10 Graphs. - Publication Year :
- 1997
-
Abstract
- Studies the relationship between carrier diffusion lengths and defect density in undoped hydrogenated amorphous silicon. Small-signal lifetime measurement; Dependence of carrier diffusion lengths on defect density; Ratio of drift mobility of electrons to that of holes in a doped silicon under illumination.
- Subjects :
- *SEMICONDUCTOR doping
*AMORPHOUS substances
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 81
- Issue :
- 3
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 9709224208
- Full Text :
- https://doi.org/10.1063/1.363888