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Relationship between carrier diffusion lengths and defect density in hydrogenated amorphous silicon.

Authors :
Sakata, I.
Yamanaka, M.
Source :
Journal of Applied Physics. 2/1/1997, Vol. 81 Issue 3, p1323. 8p. 10 Graphs.
Publication Year :
1997

Abstract

Studies the relationship between carrier diffusion lengths and defect density in undoped hydrogenated amorphous silicon. Small-signal lifetime measurement; Dependence of carrier diffusion lengths on defect density; Ratio of drift mobility of electrons to that of holes in a doped silicon under illumination.

Details

Language :
English
ISSN :
00218979
Volume :
81
Issue :
3
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
9709224208
Full Text :
https://doi.org/10.1063/1.363888