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EUV lithography.

Authors :
Hawryluk, Andrew M.
Ceglio, Natale M.
Source :
Solid State Technology. Jul97, Vol. 40 Issue 7, p151. 5p. 1 Color Photograph, 2 Diagrams, 2 Charts, 3 Graphs.
Publication Year :
1997

Abstract

Part IV. Focuses on various aspects of extreme ultraviolet lithography (EUVL). Origin; Companies involved in the development of the technology; Concepts in EUVL; Technical baseline values; Scanner performance requirements; Applications; Cost.

Subjects

Subjects :
*LITHOGRAPHY

Details

Language :
English
ISSN :
0038111X
Volume :
40
Issue :
7
Database :
Academic Search Index
Journal :
Solid State Technology
Publication Type :
Academic Journal
Accession number :
9707174943