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EUV lithography.
- Source :
-
Solid State Technology . Jul97, Vol. 40 Issue 7, p151. 5p. 1 Color Photograph, 2 Diagrams, 2 Charts, 3 Graphs. - Publication Year :
- 1997
-
Abstract
- Part IV. Focuses on various aspects of extreme ultraviolet lithography (EUVL). Origin; Companies involved in the development of the technology; Concepts in EUVL; Technical baseline values; Scanner performance requirements; Applications; Cost.
- Subjects :
- *LITHOGRAPHY
Subjects
Details
- Language :
- English
- ISSN :
- 0038111X
- Volume :
- 40
- Issue :
- 7
- Database :
- Academic Search Index
- Journal :
- Solid State Technology
- Publication Type :
- Academic Journal
- Accession number :
- 9707174943