Back to Search
Start Over
Negative photoresists for optical lithography.
- Source :
-
IBM Journal of Research & Development . Jan-Mar97, Vol. 41 Issue 1/2, p81. 14p. 12 Black and White Photographs, 12 Diagrams, 3 Graphs. - Publication Year :
- 1997
-
Abstract
- Provides an overview of the history and chemistry of negative-photoresist systems and their development in IBM Research. Negative photoresists for semiconductors and printing wiring boards (PWBs); Advantages of negative-resist chemistry; Negative resists for micromachining applications; Conclusions.
- Subjects :
- *NEGATIVE resistance devices
*PHOTORESISTS
Subjects
Details
- Language :
- English
- ISSN :
- 00188646
- Volume :
- 41
- Issue :
- 1/2
- Database :
- Academic Search Index
- Journal :
- IBM Journal of Research & Development
- Publication Type :
- Academic Journal
- Accession number :
- 9706012829
- Full Text :
- https://doi.org/10.1147/rd.411.0081