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Calibration of PIXE yields using binary thin films on Si.

Authors :
Meersschaut, J.
Carbonel, J.
Popovici, M.
Zhao, Q.
Vantomme, A.
Vandervorst, W.
Source :
Nuclear Instruments & Methods in Physics Research Section B. Jul2014, Vol. 331, p65-68. 4p.
Publication Year :
2014

Abstract

Abstract: We describe the use of binary thin films on Si to calibrate the yields in proton-induced X-ray emission (PIXE) measurements. Besides of the element to be calibrated, the standards also contain a common reference element. The incorporation of a common reference element allows one to eliminate errors in the accumulated beam charge during the calibration of the PIXE set-up. The binary calibration standards allow us to determine the response function with an accuracy close to 1%. As an example, we will perform the calibration for Fe and Co, and we will determine the Co concentration in Fe1 − x Co x thin films. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
0168583X
Volume :
331
Database :
Academic Search Index
Journal :
Nuclear Instruments & Methods in Physics Research Section B
Publication Type :
Academic Journal
Accession number :
96445846
Full Text :
https://doi.org/10.1016/j.nimb.2014.03.023