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High-mobility self-aligned top-gate oxide TFT for high-resolution AM-OLED.

Authors :
Morosawa, Narihiro
Nishiyama, Masanori
Ohshima, Yoshihiro
Sato, Ayumu
Terai, Yasuhiro
Tokunaga, Kazuhiko
Iwasaki, Junji
Akamatsu, Keiichi
Kanitani, Yuya
Tanaka, Shinji
Arai, Toshiaki
Nomoto, Kazumasa
Source :
Journal of the Society for Information Display. Nov2013, Vol. 21 Issue 11, p467-473. 7p.
Publication Year :
2013

Abstract

High-mobility and highly reliable self-aligned top-gate oxide thin-film transistor (TFTs) were developed using the aluminum reaction method. Al diffusion to the oxide semiconductor and homogenization of the oxygen concentration in the depth direction after annealing were confirmed by laser-assisted atom probe tomography. The high mobility of the top-gate TFT with amorphous indium tin zinc oxide channel was demonstrated to be 32 cm2/V s. A 9.9-in. diagonal qHD active-matrix organic light-emitting diode (AM-OLED) display was fabricated using a five-mask backplane process to demonstrate an applicable solution for large-sized and high-resolution AM-OLEDs. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
10710922
Volume :
21
Issue :
11
Database :
Academic Search Index
Journal :
Journal of the Society for Information Display
Publication Type :
Academic Journal
Accession number :
95714427
Full Text :
https://doi.org/10.1002/jsid.206