Back to Search Start Over

Surface-activating-bonding-based low-resistance Si/III-V junctions.

Authors :
J. Liang
S. Nishida
M. Morimoto
N. Shigekawa
Source :
Electronics Letters (Wiley-Blackwell). 6/20/2013, Vol. 49 Issue 13, p1-2. 2p. 1 Chart, 2 Graphs.
Publication Year :
2013

Abstract

The electrical properties of pn junctions, with various semiconductor materials with different doping concentrations fabricated by using surface-activated-bonding (SAB), were investigated by measuring their current-voltage (I-V) characteristics. The I-V characteristics of p+-GaAs/n++-Si, p+-GaAs/n+-Si, p+-Si/n+-Si, p++-Si/n+-InGaP, and p+-Si/n+-InGaP junctions showed ohmic-like properties. The interface resistance and the resultant electrical loss decreased with increasing impurity concentration at the interface. These results demonstrate the significance of SAB for fabricating tandem solar cells. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00135194
Volume :
49
Issue :
13
Database :
Academic Search Index
Journal :
Electronics Letters (Wiley-Blackwell)
Publication Type :
Academic Journal
Accession number :
95604973
Full Text :
https://doi.org/10.1049/el.2013.1553