Kinetics study of NiPt(10 at.%)/Si0.7Ge0.3 solid state reactions.

Highlights: [•] Phase sequence of solid state reactions of ultra-thin 7nm NiPt(10%) films with a Si0.7Ge0.3 layer. [•] In situ X-ray diffraction and sheet resistance (four point probes) measurements. [•] Hexagonal θ-(Ni1 − y Pt y )2(Si1 − x Ge x ). [•] Kinetics study by Kissinger analysis and finite difference simulations. [ABSTRACT FROM AUTHOR]