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Advanced process simulation of metal film deposition.

Authors :
Sorlie, Cameron
Brett, Michael J.
Source :
Solid State Technology. Jun95, Vol. 38 Issue 6, p101. 4p. 5 Diagrams, 1 Graph.
Publication Year :
1995

Abstract

Discusses advanced process simulation of metal film deposition. Film growth simulation; Collimated sputtering; Wafer-scale uniformity; Hot aluminum deposition; Metallization problems.

Subjects

Subjects :
*SEMICONDUCTOR films
*METALLIZING

Details

Language :
English
ISSN :
0038111X
Volume :
38
Issue :
6
Database :
Academic Search Index
Journal :
Solid State Technology
Publication Type :
Academic Journal
Accession number :
9507054003

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Authors Abstract Subjects Details