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Magnetoresistance and morphology in magnetic multilayers by insertion of very thin Fe, Co layers.

Authors :
Hwang, D.G.
Lee, S.S.
Lee, K.A.
Park, C.M.
Kim, M.Y.
Choi, K.R.
Choi, S.J.
Lee, Y.H.
Rhee, J.R.
Source :
IEEE Transactions on Magnetics. 1996, Vol. 32 Issue 5, p4579-4581. 3p.
Publication Year :
1996

Abstract

Dependences of magnetoresistance and morphology upon the insertion of very thin magnetic layers at interfaces between magnetic and nonmagnetic layers in Co/Cu and Ni/sub 81/Fe/sub 19//Cu multilayers have been investigated. The Co/Cu multilayers with inserted Fe thickness of 0.5/spl sim/1.0 /spl Aring/ have the MR ratio of about 18% more than the noninserted multilayers, and the MR ratio in the NiFe/Cu multilayers with inserted Co of thickness of 3 /spl Aring/ was found to be significantly increased. These results can be explained by the enhanced interlayer antiferromagnetic coupling and spin-dependent scattering phenomena at the interface. Of particular interest, the "Clustered out-growth" in the surface morphology of these multilayers was observed. [ABSTRACT FROM PUBLISHER]

Details

Language :
English
ISSN :
00189464
Volume :
32
Issue :
5
Database :
Academic Search Index
Journal :
IEEE Transactions on Magnetics
Publication Type :
Academic Journal
Accession number :
93095897
Full Text :
https://doi.org/10.1109/20.539085