Study of thermal stability and mechanical properties of amorphous Zr19W18N63 coatings deposited by DC/RF reactive magnetron sputtering.

Thermal stability and mechanical properties of Zr–W–N films have been studied. Zr–W–N films of various structure have been deposited on Si substrates by DC/RF reactive magnetron sputtering at various substrate temperatures Ts (100°–600°C) and at constant N2 partial pressure (0.27Pa). For 100°C≤Ts ≤300°C, X-ray diffraction patterns show an amorphous structure of the films which is further confirmed by transmission electron microscopy measurements. For 400°C≤Ts ≤600°C, a crystalline fcc phase with (111) and (200) orientation has been observed. Maximum wear resistance (H/Er ~0.22) and maximum resistance to fatigue fracture (H3/Er 2 ~1.1GPa) have been obtained for the amorphous films deposited at Ts =200°C. Post annealing of films deposited at 200°C has been carried out in air from 100° to 600°C. Oxygen starts to be incorporated in the films at 300°C annealing temperature (Tn) and its content increases with increasing Tn. No crystalline oxide phases are observed up to Tn =600°C. The hardness of the annealed films decreases with increasing oxygen incorporation. [ABSTRACT FROM AUTHOR]