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Luminescence behavior and compensation effect of N-doped ZnO films deposited by rf magnetron sputtering under various gas-flow ratios of O2/N2.

Authors :
Cho, Wei-Min
Lin, Yow-Jon
Liu, Chia-Jyi
Chen, Liang-Ru
Shih, Yu-Tai
Chen, Perry
Source :
Journal of Luminescence. Jan2014, Vol. 145, p884-887. 4p.
Publication Year :
2014

Abstract

Abstract: The photoluminescent and electrical properties of N-doped ZnO films fabricated by rf magnetron sputtering under various gas-flow ratios of O2/N2 were examined in this study. The dependence of conduction type on the gas-flow rate of O2/N2 was found. The authors identified a direct correlation between the defect spectral feature and conduction type of N-doped ZnO samples and provided a physical model for producing p-type ZnO. According to these observed results, the authors suggested that p-type conversion of N-doped ZnO may be due to a combined effect of the increased acceptor (substitutional nitrogen in oxygen site, zinc vacancy and interstitial oxygen) density and the decreased donor (oxygen vacancy) density. In addition, synthesis of p-type N-doped ZnO was repeated, suggesting that p-type ZnO can be fabricated with excellent reproducibility by rf magnetron sputtering a ZnO target doped with nitrogen. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
00222313
Volume :
145
Database :
Academic Search Index
Journal :
Journal of Luminescence
Publication Type :
Academic Journal
Accession number :
91974877
Full Text :
https://doi.org/10.1016/j.jlumin.2013.09.029