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Fully room-temperature IGZO thin film transistors adopting stacked gate dielectrics on flexible polycarbonate substrate.

Authors :
Hsu, Hsiao-Hsuan
Chang, Chun-Yen
Cheng, Chun-Hu
Yu, Shu-Hung
Su, Ching-Yuan
Su, Chung-Yen
Source :
Solid-State Electronics. Nov2013, Vol. 89, p194-197. 4p.
Publication Year :
2013

Abstract

Highlights: [•] IGZO TFT with GeO2/TiO2/GeO2 dielectric has been fabricated on PC substrate at room temperature. [•] RT Flexible TFT exhibits small gate swing of 0.132V/decade and good Ion/Ioff ratio of 2.4×107. [•] Such good performance was attributed to combined effect of higher-κ TiO2 and large band gap GeO2. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00381101
Volume :
89
Database :
Academic Search Index
Journal :
Solid-State Electronics
Publication Type :
Academic Journal
Accession number :
91740460
Full Text :
https://doi.org/10.1016/j.sse.2013.08.009