Dielectric permittivity of SiO[sub 2] thin films in dependence on the ambient hydrogen pressure.

MLA

Holten, Stephan, and Herbert Kliem. “Dielectric Permittivity of SiO[Sub 2] Thin Films in Dependence on the Ambient Hydrogen Pressure.” Journal of Applied Physics, vol. 93, no. 3, Feb. 2003, p. 1684. EBSCOhost, https://doi.org/10.1063/1.1532939.

APA

Holten, S., & Kliem, H. (2003). Dielectric permittivity of SiO[sub 2] thin films in dependence on the ambient hydrogen pressure. Journal of Applied Physics, 93(3), 1684. https://doi.org/10.1063/1.1532939

Chicago

Holten, Stephan, and Herbert Kliem. 2003. “Dielectric Permittivity of SiO[Sub 2] Thin Films in Dependence on the Ambient Hydrogen Pressure.” Journal of Applied Physics 93 (3): 1684. doi:10.1063/1.1532939.