Cite
Overcoming challenges to the formation of high-quality polycrystalline TiO2:Ta transparent conducting films by magnetron sputtering.
MLA
Neubert, M., et al. “Overcoming Challenges to the Formation of High-Quality Polycrystalline TiO2:Ta Transparent Conducting Films by Magnetron Sputtering.” Journal of Applied Physics, vol. 114, no. 8, Aug. 2013, p. 083707. EBSCOhost, https://doi.org/10.1063/1.4819088.
APA
Neubert, M., Cornelius, S., Fiedler, J., Gebel, T., Liepack, H., Kolitsch, A., & Vinnichenko, M. (2013). Overcoming challenges to the formation of high-quality polycrystalline TiO2:Ta transparent conducting films by magnetron sputtering. Journal of Applied Physics, 114(8), 083707. https://doi.org/10.1063/1.4819088
Chicago
Neubert, M., S. Cornelius, J. Fiedler, T. Gebel, H. Liepack, A. Kolitsch, and M. Vinnichenko. 2013. “Overcoming Challenges to the Formation of High-Quality Polycrystalline TiO2:Ta Transparent Conducting Films by Magnetron Sputtering.” Journal of Applied Physics 114 (8): 083707. doi:10.1063/1.4819088.