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Modeling of the output characteristics of advanced n-MOSFETs after a severe gate-to-channel dielectric breakdown.

Authors :
Miranda, E.
Kawanago, T.
Kakushima, K.
Suñé, J.
Iwai, H.
Source :
Microelectronic Engineering. Sep2013, Vol. 109, p322-325. 4p.
Publication Year :
2013

Abstract

Highlights: [•] We model the effects of an oxide breakdown on the transistor behaviour. [•] We consider the potentiometer model. [•] We show how the relevant feature that characterize the dielectric breakdown affect the transistor’s transconductances. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
01679317
Volume :
109
Database :
Academic Search Index
Journal :
Microelectronic Engineering
Publication Type :
Academic Journal
Accession number :
89278104
Full Text :
https://doi.org/10.1016/j.mee.2013.03.030