The deposition of intrinsic hydrogenated amorphous silicon thin films incorporated with oxygen by plasma-enhanced vapor deposition.

MLA

Lee, Ji Eun, et al. “The Deposition of Intrinsic Hydrogenated Amorphous Silicon Thin Films Incorporated with Oxygen by Plasma-Enhanced Vapor Deposition.” Solid State Sciences, vol. 20, June 2013, pp. 70–74. EBSCOhost, https://doi.org/10.1016/j.solidstatesciences.2013.03.015.

APA

Lee, J. E., Park, J. H., Yoo, J., Yoon, K. H., Kim, D., & Cho, J.-S. (2013). The deposition of intrinsic hydrogenated amorphous silicon thin films incorporated with oxygen by plasma-enhanced vapor deposition. Solid State Sciences, 20, 70–74. https://doi.org/10.1016/j.solidstatesciences.2013.03.015

Chicago

Lee, Ji Eun, Joo Hyung Park, Jinsu Yoo, Kyung Hoon Yoon, Donghwan Kim, and Jun-Sik Cho. 2013. “The Deposition of Intrinsic Hydrogenated Amorphous Silicon Thin Films Incorporated with Oxygen by Plasma-Enhanced Vapor Deposition.” Solid State Sciences 20 (June): 70–74. doi:10.1016/j.solidstatesciences.2013.03.015.