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Nanoimprint lithography: an alternative nanofabrication approach

Authors :
Sotomayor Torres, C.M.
Zankovych, S.
Seekamp, J.
Kam, A.P.
Clavijo Cedeño, C.
Hoffmann, T.
Ahopelto, J.
Reuther, F.
Pfeiffer, K.
Bleidiessel, G.
Gruetzner, G.
Maximov, M.V.
Heidari, B.
Source :
Materials Science & Engineering: C. Jan2003, Vol. 23 Issue 1/2, p23. 9p.
Publication Year :
2003

Abstract

A status report of nanoimprint lithography is given in the context of alternative nanofabrication methods. Since the ultimate resolution of nanoimprint appears to be determined by the stamp, this is discussed in detail, particularly the recent developments on polymer stamps. The scope of the technique is illustrated with applications in passive optical structures and organic devices. Throughout the report, critical dimensions are discussed, as well as other challenges facing nanoimprint lithography. [Copyright &y& Elsevier]

Subjects

Subjects :
*LITHOGRAPHY
*IMPRINTED polymers

Details

Language :
English
ISSN :
09284931
Volume :
23
Issue :
1/2
Database :
Academic Search Index
Journal :
Materials Science & Engineering: C
Publication Type :
Academic Journal
Accession number :
8804671
Full Text :
https://doi.org/10.1016/S0928-4931(02)00221-7