Selective oxidation of cube textured Ni and Ni–Cr substrate for the formation of cube textured NiO as a component buffer layer for REBa2Cu3O<f>7+x</f> (REBCO) coated conductors

Thermal oxidation of cube textured, pure Ni and Ni–Cr tapes was undertaken under different oxidation conditions to form cube textured NiO for the use as a first component of buffer layer for the coated conductor. Cube textured NiO was formed on pure Ni after oxidising for more than 130 min in O<f>2</f> at 1250 <f>°</f>C. The oxide thickness was <f>></f>30 <f>μ</f>m. Much shorter oxidation times (20–40 min, NiO thickness of <f>∼</f>5 <f>μ</f>m) and lower temperature (1050 <f>°</f>C) were required to form a similar texture on Ni–Cr foils. In addition, NiO formed on Ni–13%Cr was more highly textured than Ni–10%Cr. A Cr<f>2</f>O<f>3</f> inner layer and NiO outer layer was formed on the Ni–Cr alloys. [Copyright &y& Elsevier]