Cite
Effects of deposition temperature on polycrystalline silicon films using plasma-enhanced chemical...
MLA
Hasegawa, S., et al. “Effects of Deposition Temperature on Polycrystalline Silicon Films Using Plasma-Enhanced Chemical..” Journal of Applied Physics, vol. 84, no. 1, July 1998, p. 584. EBSCOhost, https://doi.org/10.1063/1.368085.
APA
Hasegawa, S., Sakata, M., Inokuma, T., & Kurata, Y. (1998). Effects of deposition temperature on polycrystalline silicon films using plasma-enhanced chemical.. Journal of Applied Physics, 84(1), 584. https://doi.org/10.1063/1.368085
Chicago
Hasegawa, S., M. Sakata, T. Inokuma, and Y. Kurata. 1998. “Effects of Deposition Temperature on Polycrystalline Silicon Films Using Plasma-Enhanced Chemical..” Journal of Applied Physics 84 (1): 584. doi:10.1063/1.368085.