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High performance 100 nm T-gate strained Si/Si0.6Ge0.4 n-MODFET

Authors :
Aniel, F.
Enciso-Aguilar, M.
Giguerre, L.
Crozat, P.
Adde, R.
Mack, T.
Seiler, U.
Hackbarth, Th.
Herzog, H.J.
König, U.
Raynor, B.
Source :
Solid-State Electronics. Feb2003, Vol. 47 Issue 2, p283. 7p.
Publication Year :
2003

Abstract

100 nm T-gate strained Si/Si0.6Ge0.4 n-MODFETs have reached new record cut-off frequency <f>fT</f> of 74 GHz (105 GHz), with maximum oscillation frequency <f>fmax</f> of 107 GHz (170 GHz) at temperatures 300 K (50 K). Moreover they show a low noise figure <f>NFmin</f> of 0.4 dB and noise resistance <f>Rn</f> of 52 <f>Ω</f> at 2.5 GHz and 300 K. The dependence of electric parameters and RF performances of the device on biases and temperature is presented. Experimental results are compared with physical simulations at short gate lengths to analyze carrier transport and further device optimization. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
00381101
Volume :
47
Issue :
2
Database :
Academic Search Index
Journal :
Solid-State Electronics
Publication Type :
Academic Journal
Accession number :
8547316
Full Text :
https://doi.org/10.1016/S0038-1101(02)00208-3