Nanostructured Films of Block Copolymers Functionalized With Photolabile Protected Amino Groups.

Two phase separating block copolymers with photolabile protected amino groups in one block have been synthesized through RAFT polymerization followed by efficient click modification. Techniques like NMR, GPC, and DSC were applied for the characterization of these functional materials. The block copolymers were used for the preparation of thin films where they assemble to form distinct nanostructures as detected by AFM analysis. [ABSTRACT FROM AUTHOR]