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A cross-sectional atomic force microscopy study of nanocrystalline Ge precipitates in SiO2 formed...

Authors :
Blaser, J.M.
Paine, D.C.
Source :
Journal of Applied Physics. 8/15/1997, Vol. 82 Issue 4, p1626. 6p. 5 Black and White Photographs, 4 Graphs.
Publication Year :
1997

Abstract

Studies the precipitation and growth of Ge crystallites formed via a two-step process of hydrothermal oxidation of Si1-xGexO2 and subsequent chemical reduction in forming gas. Ge-particle distributions; Particle diameters and their position relative to the Si/oxide interface with closed circles.

Subjects

Subjects :
*CRYSTALLINE interfaces

Details

Language :
English
ISSN :
00218979
Volume :
82
Issue :
4
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
82962