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Correlation between in-plane strain and optical polarization of Si-doped AlGaN epitaxial layers as a function of Al content and Si concentration.

Authors :
Kurai, Satoshi
Shimomura, Kazuhide
Murotani, Hideaki
Yamada, Yoichi
Miyake, Hideto
Hiramatsu, Kazumasa
Source :
Journal of Applied Physics. Aug2012, Vol. 112 Issue 3, p033512-033512-5. 1p.
Publication Year :
2012

Abstract

We have investigated the relationship between in-plane strain and optical polarization in AlGaN epitaxial layers as a function of Al content and of Si concentration. Al content and in-plane strain were measured by reciprocal space mapping using a simple relationship from the tensor of elastic moduli. The change of valence band energy separation based on the measured in-plane strain was in good agreement with the change of polarization degree as a function of Al content. The dependence of polarization degree on Si concentration was also explained by the change of in-plane strain, and polarization switching occurred around the Al content and strain as calculated by the k · p approach with the cubic approximation. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00218979
Volume :
112
Issue :
3
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
78722590
Full Text :
https://doi.org/10.1063/1.4743016