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Studies of electronic sputtering of fullerene under swift heavy ion impact

Authors :
Ghosh, S.
Avasthi, D.K.
Tripathi, A.
Srivastava, S.K.
Nageswara Rao, S.V.S.
Som, T.
Mittal, V.K.
Grüner, F.
Assmann, W.
Source :
Nuclear Instruments & Methods in Physics Research Section B. May2002, Vol. 190 Issue 1-4, p169. 4p.
Publication Year :
2002

Abstract

The present work reports the dependence of electronic sputtering on thickness of fullerene film. The energetic ions of 200 MeV Au15+ are taken from NSC Pelletron at New Delhi and the Tandem accelerator at Munich. On-line elastic recoil detection analysis (ERDA) with <f>ΔE–E</f> telescope detector is used to determine the electronic sputtering yield. We observed systematic decrease in sputtering yield of carbon with increase in film (C60/silicon) thickness. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
0168583X
Volume :
190
Issue :
1-4
Database :
Academic Search Index
Journal :
Nuclear Instruments & Methods in Physics Research Section B
Publication Type :
Academic Journal
Accession number :
7797193
Full Text :
https://doi.org/10.1016/S0168-583X(02)00474-3