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Studies of electronic sputtering of fullerene under swift heavy ion impact
- Source :
-
Nuclear Instruments & Methods in Physics Research Section B . May2002, Vol. 190 Issue 1-4, p169. 4p. - Publication Year :
- 2002
-
Abstract
- The present work reports the dependence of electronic sputtering on thickness of fullerene film. The energetic ions of 200 MeV Au15+ are taken from NSC Pelletron at New Delhi and the Tandem accelerator at Munich. On-line elastic recoil detection analysis (ERDA) with <f>ΔE–E</f> telescope detector is used to determine the electronic sputtering yield. We observed systematic decrease in sputtering yield of carbon with increase in film (C60/silicon) thickness. [Copyright &y& Elsevier]
- Subjects :
- *SPUTTERING (Physics)
*HEAVY ions
*FULLERENES
Subjects
Details
- Language :
- English
- ISSN :
- 0168583X
- Volume :
- 190
- Issue :
- 1-4
- Database :
- Academic Search Index
- Journal :
- Nuclear Instruments & Methods in Physics Research Section B
- Publication Type :
- Academic Journal
- Accession number :
- 7797193
- Full Text :
- https://doi.org/10.1016/S0168-583X(02)00474-3