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Theory of the copper vacancy in cuprous oxide.
- Source :
-
Journal of Applied Physics . 11/15/2002, Vol. 92 Issue 10, p5849. 3p. 3 Diagrams. - Publication Year :
- 2002
-
Abstract
- Density-functional theory is used to examine aspects of the copper vacancy (V[SUBCu]) in cuprous oxide (Cu[SUB2]O). The normal vacancy configuration, obtained by simple removal of a Cu atom from the lattice, is found to be 0.1 eV higher in energy than a split vacancy configuration wherein a nearby Cu atom is displaced toward a normal vacancy site by half the bulk Cu-Cu separation. Jumps between the normal and split vacancy configurations are predicted to be rate limiting for V[SUBCu] diffusion with an energy barrier of 0.3 eV. Binding of V[SUBCu] to substitutional aluminum (Al[SUBCu]) and indium (In[SUBCu]) is examined. The neutral (Al[SUBCu] + 2 V[SUBCu]) complex is found to have a binding energy of 3.3 eV whereas the neutral (In[SUBCu] + 2 V[SUBCu]) complex is bound by 1.7 eV. The magnitudes of these binding energies suggest that Al[SUBCu] and In[SUBCu] should inhibit V[SUBCu] diffusion in Cu[SUB2]O. [ABSTRACT FROM AUTHOR]
- Subjects :
- *ELECTRON configuration
*COPPER oxide
*SEMICONDUCTORS
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 92
- Issue :
- 10
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7711482
- Full Text :
- https://doi.org/10.1063/1.1516620