Cite
Amorphous (Mo, Ta, or W)–Si–N diffusion barriers for Al metallizations.
MLA
Reid, J. S., et al. “Amorphous (Mo, Ta, or W)–Si–N Diffusion Barriers for Al Metallizations.” Journal of Applied Physics, vol. 79, no. 2, Jan. 1996, p. 1109. EBSCOhost, https://doi.org/10.1063/1.360909.
APA
Reid, J. S., Kolawa, E., Garland, C. M., Nicolet, M.-A., Cardone, F., Gupta, D., & Ruiz, R. P. (1996). Amorphous (Mo, Ta, or W)–Si–N diffusion barriers for Al metallizations. Journal of Applied Physics, 79(2), 1109. https://doi.org/10.1063/1.360909
Chicago
Reid, J. S., E. Kolawa, C. M. Garland, M.-A. Nicolet, F. Cardone, D. Gupta, and R. P. Ruiz. 1996. “Amorphous (Mo, Ta, or W)–Si–N Diffusion Barriers for Al Metallizations.” Journal of Applied Physics 79 (2): 1109. doi:10.1063/1.360909.