Structure and grain boundary defects of glow-discharge polycrystalline silicon films deposited using disilane.

MLA

Hasegawa, S., et al. “Structure and Grain Boundary Defects of Glow-Discharge Polycrystalline Silicon Films Deposited Using Disilane.” Journal of Applied Physics, vol. 77, no. 1, Jan. 1995, p. 357. EBSCOhost, https://doi.org/10.1063/1.359330.

APA

Hasegawa, S., Fujimoto, E., Inokuma, T., & Kurata, Y. (1995). Structure and grain boundary defects of glow-discharge polycrystalline silicon films deposited using disilane. Journal of Applied Physics, 77(1), 357. https://doi.org/10.1063/1.359330

Chicago

Hasegawa, S., E. Fujimoto, T. Inokuma, and Y. Kurata. 1995. “Structure and Grain Boundary Defects of Glow-Discharge Polycrystalline Silicon Films Deposited Using Disilane.” Journal of Applied Physics 77 (1): 357. doi:10.1063/1.359330.