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Early stages of diamond growth by chemical-vapor deposition monitored both by electron spectroscopies and microstructural probes.
- Source :
-
Journal of Applied Physics . 8/1/1996, Vol. 80 Issue 3, p1830. 16p. - Publication Year :
- 1996
-
Abstract
- Presents information on a study which examined nucleation and growth kinetics of chemical vapor deposition diamond thin films on silicon. Background of the study; Methodology of the study; Results and discussion.
- Subjects :
- *DIAMOND thin films
*CHEMICAL vapor deposition
*NUCLEATION
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 80
- Issue :
- 3
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7658643
- Full Text :
- https://doi.org/10.1063/1.362995