Structural characterization of ion-beam synthesized NiSi2 layers.

Authors :: Wu, M. F.
De Wachter, J.
Van Bavel, A.-M.
Moons, R.
Vantomme, A.
Pattyn, H.
Langouche, G.
Bender, H.
Vanhellemont, J.
Temst, K.
Bruynseraede, Y.
Source :: Journal of Applied Physics. 8/1/1995, Vol. 78 Issue 3, p1707. 6p. 9 Graphs.
Publication Year :: 1995
Abstract: Focuses on the formation of nickel (Ni)-silicon (Si) layers with good crystalline quality by ion-beam synthesis. Use of Rutherford backscattering spectrometry and transmission electron microscopy; Structural difference between NiSi[sub2] and cobalt-Si; Overview of the x-ray diffraction measurements.