In situ study of film stresses in metal silicides using absorption-edge-contour mapping.

MLA

White, G. E., and Haydn Chen. “In Situ Study of Film Stresses in Metal Silicides Using Absorption-Edge-Contour Mapping.” Journal of Applied Physics, vol. 68, no. 7, Oct. 1990, p. 3317. EBSCOhost, https://doi.org/10.1063/1.346384.

APA

White, G. E., & Chen, H. (1990). In situ study of film stresses in metal silicides using absorption-edge-contour mapping. Journal of Applied Physics, 68(7), 3317. https://doi.org/10.1063/1.346384

Chicago

White, G. E., and Haydn Chen. 1990. “In Situ Study of Film Stresses in Metal Silicides Using Absorption-Edge-Contour Mapping.” Journal of Applied Physics 68 (7): 3317. doi:10.1063/1.346384.