Bonding and electrical properties of boron-doped microcrystalline SiNx:H films.

Presents information on a study which analyzed the effects brought about by the addition of nitrogen on the bonding properties as a function of the degree of crystallization for boron-doped microcrystalline into amorphous silicon nitride[subx]:hydrogen films. Investigation of the degree of crystallization by means of x-ray diffraction; Vibrational-absorption profiles; Electrical and optical properties.