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A controllable mechanism of forming extremely low-resistance nonalloyed ohmic contacts to group III-V compound semiconductors.

Authors :
Stareev, G.
Künzel, H.
Dortmann, G.
Source :
Journal of Applied Physics. 12/15/1993, Vol. 74 Issue 12, p7344. 13p.
Publication Year :
1993

Abstract

Presents information on a study which established the formation mechanism and characterized extremely low-resistance nonalloyed titanium-platinum-gold contacts to indium and gallium compounds. Methods; Results; Discussion.

Details

Language :
English
ISSN :
00218979
Volume :
74
Issue :
12
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7653469
Full Text :
https://doi.org/10.1063/1.355002