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Wet oxidation of GeSi at 700 °C.

Authors :
Liu, W. S.
Lee, E. W.
Nicolet, M-A.
Arbet-Engels, V.
Wang, K. L.
Abuhadba, N. M.
Aita, C. R.
Source :
Journal of Applied Physics. 4/15/1992, Vol. 71 Issue 8, p4015. 4p. 4 Graphs.
Publication Year :
1992

Abstract

Focuses on a study which examined the influence of temperature on the wet oxidation of germanium silicate. Background to the study; Backscattering spectrometry results; Conclusion.

Subjects

Subjects :
*OXIDATION
*TEMPERATURE
*GERMANIUM
*SILICATES

Details

Language :
English
ISSN :
00218979
Volume :
71
Issue :
8
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7653116
Full Text :
https://doi.org/10.1063/1.350847
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