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Influence of deposition rate and hydrogen/helium dilution on the structural relaxation of a-SiGe:H network prepared at low substrate temperature.

Authors :
Middya, A. R.
Ray, Swati
Source :
Journal of Applied Physics. 6/1/1994, Vol. 75 Issue 11, p7340. 9p.
Publication Year :
1994

Abstract

Presents a study which developed device quality a-silicon germanide: hydrogen alloy at low substrate temperature suitable for solar-cell fabrication using low flow rate of silane and germane and strong hydrogen dilution. Discussion on the optoelectronic properties of a-silicon germanide: hydrogen films; Correlation between optoelectronic properties and structural properties and midgap defect densities; Comparison of the quantum efficiencies of several Schottky barrier devices.

Details

Language :
English
ISSN :
00218979
Volume :
75
Issue :
11
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7651996
Full Text :
https://doi.org/10.1063/1.356646