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Influence of deposition rate and hydrogen/helium dilution on the structural relaxation of a-SiGe:H network prepared at low substrate temperature.
- Source :
-
Journal of Applied Physics . 6/1/1994, Vol. 75 Issue 11, p7340. 9p. - Publication Year :
- 1994
-
Abstract
- Presents a study which developed device quality a-silicon germanide: hydrogen alloy at low substrate temperature suitable for solar-cell fabrication using low flow rate of silane and germane and strong hydrogen dilution. Discussion on the optoelectronic properties of a-silicon germanide: hydrogen films; Correlation between optoelectronic properties and structural properties and midgap defect densities; Comparison of the quantum efficiencies of several Schottky barrier devices.
- Subjects :
- *GERMANIDES
*SILICON compounds
*ALLOYS
*SILANE
*OPTOELECTRONICS
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 75
- Issue :
- 11
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7651996
- Full Text :
- https://doi.org/10.1063/1.356646