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Condensation of metal and semiconductor vapors during nozzle expansion.

Authors :
Yang, S.-N.
Lu, T.-M.
Source :
Journal of Applied Physics. 7/1/1985, Vol. 58 Issue 1, p541. 4p. 1 Chart, 5 Graphs.
Publication Year :
1985

Abstract

Examines the homogeneous nucleation and growth of metal and semiconductor clusters during nozzle expansion. Information on the ionized cluster beam technique; Nucleation rate calculations; Conclusion.

Subjects

Subjects :
*CONDENSATION
*METALS
*SEMICONDUCTORS
*VAPORS
*NUCLEATION

Details

Language :
English
ISSN :
00218979
Volume :
58
Issue :
1
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7651020
Full Text :
https://doi.org/10.1063/1.335659
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