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Kinetics and mechanism of wet oxidation of GexSi1-x alloys.
- Source :
-
Journal of Applied Physics . 2/1/1994, Vol. 75 Issue 3, p1764. 7p. 1 Diagram, 3 Graphs. - Publication Year :
- 1994
-
Abstract
- Presents a study which examined the kinetics and mechanism of wet oxidation of germanium[subx]silicon[sub1-x] alloys. Experimental methods; Results; Discussion.
- Subjects :
- *OXIDATION
*SILICON alloys
*GERMANIUM alloys
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 75
- Issue :
- 3
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7650584
- Full Text :
- https://doi.org/10.1063/1.356368