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Influence of rf power on the properties of hydrogenated amorphous silicon carbon alloy films prepared by magnetron sputtering of silicon in methane-argon gas mixtures.
- Source :
-
Journal of Applied Physics . 11/1/1985, Vol. 58 Issue 9, p3504. 4p. 7 Graphs. - Publication Year :
- 1985
-
Abstract
- Provides information on a study that investigated the radio frequency power dependence of structural, optical, electrical and optoelectronic properties of hydrogenated amorphous silicon carbon alloy films prepared by magnetron sputtering of silicon in methane-argon gas mixtures. Methodology of the study; Results and discussion on the study; Conclusions.
- Subjects :
- *THIN films
*RADIOFREQUENCY spectroscopy
*SPUTTERING (Physics)
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 58
- Issue :
- 9
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7649229
- Full Text :
- https://doi.org/10.1063/1.335775