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Vertical element redistribution in Ni78B11Si11 amorphous films deposited on Si as revealed by scanning Auger microprobe and cross-sectional transmission electron microscopy.
- Source :
-
Journal of Applied Physics . 4/1/1989, Vol. 65 Issue 7, p2717. 6p. 3 Black and White Photographs, 1 Diagram, 7 Graphs. - Publication Year :
- 1989
-
Abstract
- Examines vertical element redistribution in nickel[sub78]boron[sub11]silicon[sub11] amorphous films deposited on silicon wafers. Details on the experiment; Results of the study; Discussion of findings.
- Subjects :
- *NICKEL
*BORON
*SILICON
*THIN films
*SEMICONDUCTOR wafers
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 65
- Issue :
- 7
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7641004
- Full Text :
- https://doi.org/10.1063/1.342758