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Plasma structures in an electron cyclotron resonance plasma processing device.
- Source :
-
Journal of Applied Physics . 10/15/1991, Vol. 70 Issue 8, p4165. 7p. 1 Diagram, 10 Graphs. - Publication Year :
- 1991
-
Abstract
- Presents a study that investigated the basic characteristics of the electron cyclotron resonance (ECR) plasma produced in the standard NTT-type plasma chemical vapor deposition device. Use of the ECR; Measurement of the radial plasma profiles; Analysis of the axial plasma profiles.
- Subjects :
- *ELECTRON cyclotron resonance sources
*CHEMICAL vapor deposition
*PLASMA gases
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 70
- Issue :
- 8
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7637793
- Full Text :
- https://doi.org/10.1063/1.349139