Back to Search
Start Over
Properties of Si-rich SiNx:H films prepared by plasma-enhanced chemical vapor deposition.
- Source :
-
Journal of Applied Physics . 10/15/1988, Vol. 64 Issue 8, p3949. 9p. 8 Diagrams, 1 Chart, 8 Graphs. - Publication Year :
- 1988
-
Abstract
- Presents a study that investigated silicon-rich silicon nitride films prepared by plasma-enhanced chemical vapor deposition technique. Experimental procedure; Results; Discussion.
- Subjects :
- *SILICON
*SILICON nitride
*THIN films
*CHEMICAL vapor deposition
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 64
- Issue :
- 8
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7637495
- Full Text :
- https://doi.org/10.1063/1.341352