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Properties of plasma-deposited Si-rich silicon nitride films in current enhancement injectors.
- Source :
-
Journal of Applied Physics . 10/15/1988, Vol. 64 Issue 8, p3958. 7p. 4 Diagrams, 12 Graphs. - Publication Year :
- 1988
-
Abstract
- Presents a study that investigated the properties of plasma-deposited silicon-rich silicon nitride films in current enhancement injectors. Experimental procedure; Results; Discussion.
- Subjects :
- *SILICON
*SILICON nitride
*THIN films
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 64
- Issue :
- 8
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7637494
- Full Text :
- https://doi.org/10.1063/1.341353