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Properties of plasma-deposited Si-rich silicon nitride films in current enhancement injectors.

Authors :
Kaya, Çetin
Ma, Tso-Ping
Barker, Richard C.
Source :
Journal of Applied Physics. 10/15/1988, Vol. 64 Issue 8, p3958. 7p. 4 Diagrams, 12 Graphs.
Publication Year :
1988

Abstract

Presents a study that investigated the properties of plasma-deposited silicon-rich silicon nitride films in current enhancement injectors. Experimental procedure; Results; Discussion.

Details

Language :
English
ISSN :
00218979
Volume :
64
Issue :
8
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7637494
Full Text :
https://doi.org/10.1063/1.341353