Back to Search Start Over

Amorphous iron particles in cosputtered Fe-SiO2 films.

Authors :
Holtz, R. L.
Edelstein, A. S.
Lubitz, P.
Gossett, C. R.
Source :
Journal of Applied Physics. 10/15/1988, Vol. 64 Issue 8, p4251. 3p.
Publication Year :
1988

Abstract

Presents information on a study which produced small silicon-stabilized amorphous iron particles in a silica matrix by cosputtering under conditions that disturb the Si:O stoichiometry obtained from the SiO[sub2] source. Description of the switching phenomena; Deposition of films on carbon-film transmission electron microscopy grids; Results of Rutherford backscattering measurements.

Details

Language :
English
ISSN :
00218979
Volume :
64
Issue :
8
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7637443
Full Text :
https://doi.org/10.1063/1.341297