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Amorphous iron particles in cosputtered Fe-SiO2 films.
- Source :
-
Journal of Applied Physics . 10/15/1988, Vol. 64 Issue 8, p4251. 3p. - Publication Year :
- 1988
-
Abstract
- Presents information on a study which produced small silicon-stabilized amorphous iron particles in a silica matrix by cosputtering under conditions that disturb the Si:O stoichiometry obtained from the SiO[sub2] source. Description of the switching phenomena; Deposition of films on carbon-film transmission electron microscopy grids; Results of Rutherford backscattering measurements.
- Subjects :
- *AMORPHOUS substances
*SPUTTERING (Physics)
*STOICHIOMETRY
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 64
- Issue :
- 8
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7637443
- Full Text :
- https://doi.org/10.1063/1.341297