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Dry etching of niobium using CCl2F2 and CF4: A comparison.

Authors :
Sasserath, Jay N.
Source :
Journal of Applied Physics. 11/15/1990, Vol. 68 Issue 10, p5324. 5p. 2 Black and White Photographs, 2 Charts, 6 Graphs.
Publication Year :
1990

Abstract

Focuses on a study which compared the freon 12 and freon 14 as an etchant of niobium for patterning of high density superconductive circuits. Experimental techniques; Effect of pressure and power on film etch rates; Effect of electrode temperature.

Subjects

Subjects :
*NIOBIUM
*ETCHING
*SUPERCONDUCTORS

Details

Language :
English
ISSN :
00218979
Volume :
68
Issue :
10
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7636662
Full Text :
https://doi.org/10.1063/1.347026
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