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Low-temperature deposition of silicon dioxide films from electron cyclotron resonant microwave plasmas.
- Source :
-
Journal of Applied Physics . 3/15/1989, Vol. 65 Issue 6, p2457. 7p. - Publication Year :
- 1989
-
Abstract
- Investigates the deposition of silicon dioxide films on crystalline silicon substrates by electron cyclotron resonant (ECR) microwave plasma-enhanced chemical vapor deposition. Background of the experiment; Differences between radio frequency and ECR microwave plasma chemistries; Properties of the films as a function of the plasma or coil to substrate distance.
- Subjects :
- *CHEMICAL vapor deposition
*SILICA
*ELECTRON cyclotron resonance sources
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 65
- Issue :
- 6
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7633869
- Full Text :
- https://doi.org/10.1063/1.342815