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Spatial distribution of recombination centers in GaAs:Te: Effects of the doping level.
- Source :
-
Journal of Applied Physics . 7/15/1994, Vol. 76 Issue 2, p987. 6p. 6 Black and White Photographs, 3 Diagrams, 9 Graphs. - Publication Year :
- 1994
-
Abstract
- Presents a study which investigated the distribution in liquid-encapsulated-Czochralski GaAs:Te wafers of point and complex defects together with their influence on the minority-carrier diffusion length. Characteristics of the wafers of liquid-encapsulated-Czochralski gallium arsenide tellurium doped; Methods used; Results of the study.
- Subjects :
- *GALLIUM arsenide
*TELLURIUM
*SEMICONDUCTOR wafers
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 76
- Issue :
- 2
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7632790
- Full Text :
- https://doi.org/10.1063/1.357783