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Theoretical studies of the electron scattering effect on developed pattern profiles in x-ray lithography.
- Source :
-
Journal of Applied Physics . 1/15/1985, Vol. 57 Issue 2, p575. 6p. 1 Diagram, 1 Chart, 7 Graphs. - Publication Year :
- 1985
-
Abstract
- Presents theoretical studies of the electron scattering effect on developed pattern profiles in X-ray lithography. Description of a Monte Carlo simulation of the production of photoelectrons and Auger electrons in a thin positive resist polymethyl methacrylate; Production of photoelectrons and Auger electrons; Simulation of generated electrons and etching profiles.
- Subjects :
- *X-ray lithography
*MONTE Carlo method
*PHOTOELECTRONS
*POLYMETHYLMETHACRYLATE
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 57
- Issue :
- 2
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7630019
- Full Text :
- https://doi.org/10.1063/1.334740