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Surface-energy-driven grain growth during rapid thermal annealing (<10 s) of thin silicon films.

Authors :
Garrison, S. M.
Cammarata, R. C.
Thompson, C. V.
Smith, Henry I.
Source :
Journal of Applied Physics. 2/15/1987, Vol. 61 Issue 4, p1652. 4p. 1 Black and White Photograph, 2 Graphs.
Publication Year :
1987

Abstract

Examines the initial kinetics of surface-energy-driven grain growth (SEDGG) in silicon that occurred during rapid thermal annealing. Description of the SEDGG; Fraction of the area of a thin film transformed to secondary grains; Definition of extended fraction.

Details

Language :
English
ISSN :
00218979
Volume :
61
Issue :
4
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7628694
Full Text :
https://doi.org/10.1063/1.338055