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Low-energy contributions to positron implantation.

Authors :
Ritley, K. A.
Lynn, K. G.
Ghosh, V. J.
Welch, D. O.
McKeown, M.
Source :
Journal of Applied Physics. 9/1/1993, Vol. 74 Issue 5, p3479. 18p.
Publication Year :
1993

Abstract

Presents information on a study which employed a Monte Carlo calculation to examine the behavior of the implantation profiles and other quantities in the energy range from 25 electronvolt to thermal energies. Procedure for the Monte Carlo method; Effects of the scattering mechanisms in the proposed model; Validation of the power-law description of the mean depth; Implantation profiles.

Details

Language :
English
ISSN :
00218979
Volume :
74
Issue :
5
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7622044
Full Text :
https://doi.org/10.1063/1.355282