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Low-energy contributions to positron implantation.
- Source :
-
Journal of Applied Physics . 9/1/1993, Vol. 74 Issue 5, p3479. 18p. - Publication Year :
- 1993
-
Abstract
- Presents information on a study which employed a Monte Carlo calculation to examine the behavior of the implantation profiles and other quantities in the energy range from 25 electronvolt to thermal energies. Procedure for the Monte Carlo method; Effects of the scattering mechanisms in the proposed model; Validation of the power-law description of the mean depth; Implantation profiles.
- Subjects :
- *MONTE Carlo method
*SCATTERING (Physics)
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 74
- Issue :
- 5
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7622044
- Full Text :
- https://doi.org/10.1063/1.355282