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Growth of Diamond Films on Crystalline Silicon by Hot-Filament Chemical Vapor Deposition.

Authors :
Baıdakova, M. V.
Vul’, A. Ya.
Golubev, V. G.
Grudinkin, S. A.
Melekhin, V. G.
Feoktistov, N. A.
Krüger, A.
Source :
Semiconductors. Jun2002, Vol. 36 Issue 6, p615. 6p.
Publication Year :
2002

Abstract

The effect of hot-filament chemical vapor deposition conditions on the phase composition of diamond films grown on a silicon substrate was studied. The growth conditions providing the highest content of diamond phase at a growth rate of about 1 µm/h were ascertained. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
10637826
Volume :
36
Issue :
6
Database :
Academic Search Index
Journal :
Semiconductors
Publication Type :
Academic Journal
Accession number :
7292090
Full Text :
https://doi.org/10.1134/1.1485657