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Growth of Diamond Films on Crystalline Silicon by Hot-Filament Chemical Vapor Deposition.
- Source :
-
Semiconductors . Jun2002, Vol. 36 Issue 6, p615. 6p. - Publication Year :
- 2002
-
Abstract
- The effect of hot-filament chemical vapor deposition conditions on the phase composition of diamond films grown on a silicon substrate was studied. The growth conditions providing the highest content of diamond phase at a growth rate of about 1 µm/h were ascertained. [ABSTRACT FROM AUTHOR]
- Subjects :
- *DIAMOND thin films
*CHEMICAL vapor deposition
Subjects
Details
- Language :
- English
- ISSN :
- 10637826
- Volume :
- 36
- Issue :
- 6
- Database :
- Academic Search Index
- Journal :
- Semiconductors
- Publication Type :
- Academic Journal
- Accession number :
- 7292090
- Full Text :
- https://doi.org/10.1134/1.1485657